Crystal growth simulator using organometallic vapor phase epitaxy.
Numerical simulation analysis tool for organic metal vapor phase growth method of compound semiconductors.
This introduces a case study of the process simulator PROCOM for Metal-Organic Chemical Vapor Deposition (MOCVD). PROCOM provides a comprehensive model of the MOCVD process that takes into account fluid dynamics, mass transport, heat transport, and non-equilibrium gas-gas or non-equilibrium gas-surface chemical reactions. It features an integrated GUI tool that can handle geometric structures, mesh, and chemical reaction control. The rotating disk model is effective and highlights the advantages of using a rotating disk in MOCVD.
- Company：クロスライトソフトウェアインク日本支社
- Price：Other
